Now showing items 1-2 of 2

    • A study of plasma source ion implantation. 

      Thomas, Kim. (1993)
      The work described in this thesis is an analysis of the Plasma Source Ion Implantation (PSII) process. A metal target is placed within a plasma, and pulsed to a high negative potential (10 - 50 kV). The electrons in the ...
    • Two-dimensional plasma sheath observations in plasma source ion implantation. 

      Meyer, Kevin Alan. (1996)
      Plasma Source Ion Implantation (PSII) is the process of implanting high energy ions [10-50 keV] into metallic targets, by pulsing them negatively whilst immersed in a background plasma. PSII achieves surface hardening, ...