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dc.contributor.advisorJarvis, Alan Lawrence Leigh.
dc.contributor.advisorDoyle, Terence B.
dc.creatorCoetsee, Dirk.
dc.date.accessioned2011-11-10T12:47:18Z
dc.date.available2011-11-10T12:47:18Z
dc.date.created2004
dc.date.issued2004
dc.identifier.urihttp://hdl.handle.net/10413/4307
dc.descriptionThesis (M.Sc.Eng.)-University of KwaZulu-Natal, Durban, 2004.en
dc.description.abstractA simple, low-cost plasma reactor was developed for the purpose of carrying out thin film deposition experiments. The reactor is based largely on the Atmospheric Pressure Nonequilibrium Plasma (APNEP) design with a simple modification. It was used in an attempt to fabricate magnesium diboride thin films via a novel, but unsuccessful CVD process where plasma etching provides a precursor boron flux. Carbon nanotubes were successfully synthesised with the apparatus using a plasma-based variation of the floating catalyst or vapour phase growth method. The affect of various parameters and chemicals on the quality of nanotube production was assessed.en
dc.language.isoenen
dc.subjectTheses--Electronic engineering.en
dc.titleExperiments in thin film deposition : plasma-based fabrication of carbon nanotubes and magnesium diboride thin films.en
dc.typeThesisen


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